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Intern - EUV Lithography

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Micron Technology

Jan 17, 2024

Applications are closed

  • Internship
    Full-time
    Off-cycle Internship
  • Science
    Engineering
  • Boise

Requirements

  • Coursework or experience in photolithography and semiconductor manufacturing preferred.
  • Data Science, programming experience, and coursework/experience in statistics and data analysis are preferred.
  • Strong interest in research/development and ability to build production-worthy technologies.
  • Capable of working independently and to complete projects in a timely manner.
  • Work well in groups.
  • Good analytical skills.
  • Strong communication skills (written, verbal and presentation).
  • Education:
  • Applicants should be working towards a B.S., M.S., or PhD in Engineering, Chemistry, Physics, or study relevant to Photolithography.
  • Must be a current student, must not graduate before September 2024.

Responsibilities

  • Design of experiments (DOE) to optimize photolithography processes. This could include EUV lithography, photoresist optimization, or other topics.
  • Plan and run experiments in our semiconductor cleanroom using advanced technology.
  • Analyze images and data using in-house and commercial software. Data may include CD-SEM measurements, line width roughness (LWR), registration, cross sections, etc.
  • Communicate plans, status, and results of projects in written reports and presentations, including the analysis and interpretation of data.
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Micron Technology

We're accelerating the transformation of information to intelligence.

Manufacturing & Electronics
Industry
1-10
Employees
1978
Founded Year

Mission & Purpose

Micron is a world leader in innovative memory solutions that transform how the world uses information. We have approximately 40,000 team members in 17 countries who work with the world’s most trusted brands, delivering memory and storage systems for a broad range of applications and sparking countless possibilities in technology.